2M Strumenti in collaborazione con Sentech organizza il Workshop ‘Nuovi Sviluppi Sui Processi di Etching e Deposizione Assistiti da Plasma’ presso il Politecnico di Torino.
GIOVEDI’ 24 NOVEMBRE 2016, H. 9.00
Politecnico di Torino
Aula Perucca, DISAT, Ingresso 1
PROGRAMMA:
9:00 Registration
9:30 Welcome to the Workshop – Presentation of 2M Strumenti and SENTECH
9:45 SENTECH – Experts of plasma process technology and thin film metrology
New developments at SENTECH
Dr. Bernd Gruska, International Sales and Marketing Manager
10:30 Layer structures deposited by Atomic Layer Deposition using SENTECH proprietary true remote plasma source
Dr. Hassan Gargouri, Head of SENTECH plasma application lab
11:00 Coffee break and discussions
11:20 Silicon high aspect ratio structures prepared by ICP plasma etching using SENTECH SI 500
Dr. Marcel Schulze, Senior Application Engineer
12:00 Silane and liquid precursor based oxides deposited by low temperature ICPECVD
Dr. Hassan Gargouri, Head of SENTECH plasma application lab
12:40 Lunch break
13:30 Analysis of optical properties of wide band gap materials by spectroscopic ellipsometry using SENTECH new SENresearch 4.0
Dr. Bernd Gruska, Head of Metrology Application Lab
14:10 Spectroscopic ellipsometry in the infrared spectral range – application overview for organic, metallic and dielectric films
Dr. Bernd Gruska, Head of SENTECH application lab of metrology
15:00 End of seminar – Time for answering individual questions
