Materiale per SEM e TEM

G [BOX]

24 Febbraio, 2016/da Demo

G [SAFE]

24 Febbraio, 2016/da Demo

PECS II System

Broad argon ion beam system designed to polish and coat samples for SEM imaging and analytical techniques
26 Febbraio, 2016/da Demo

Ilion II System

Ideal for low energy surface preparation for your SEM cross section viewing
26 Febbraio, 2016/da Demo

QScan AFM

7 Marzo, 2016/da Demo

Monocromatori

Bentham has been designing and manufacturing monochromators for over thirty years and has built up a comprehensive range of monochromators to suit almost every light measurement application.
9 Marzo, 2016/da Demo

Dutch universities opt for SENTECH service and flexibility

22 Aprile, 2016/da Francesca Fedele

SENresearch 4.0: Spectroscopic ellipsometry in widest spectral range

The new SENresearch 4.0 is designed for spectroscopic ellipsometry in the widest spectral range from 190 nm (deep UV) to 3,500 nm (NIR)
22 Aprile, 2016/da Demo

AIX G5+ C qualified for manufacturing of high-voltage GaN-on-Si materials in joint project with imec

22 Aprile, 2016/da Demo

Graphenea increases capacity with AIXTRON BM Pro

22 Aprile, 2016/da Demo

RIE plasma etcher SI 591 compact

With the SI 591 compact, a variety of chlorine and fluorine based plasma etching processes can be performed reproducibly with a vacuum load lock and fully computer controlled processing. The SI 591 compact is characterized by a small footprint and flexible design for RIE plasma etching, e.g. the SI 591 compact can be integrated into a cluster system.
22 Aprile, 2016/da Demo

GCI to launch offer for AIXTRON SE

13 Giugno, 2016/da Demo