Planetary Reactor

The Planetary Reactor is based on the principle of a horizontal laminar flow reactor.

The laminar flow principle ensures extremely precise transitions between different materials, and an unparalleled control over the deposition rates for films that are only a few atoms thick.

AIX G5+ characteristics

  • Unique axis symmetric wafer performance like Si single wafer reactor
    • Wafer bow
    • Thickness, composition, concentration
    • Device yield
  • Warm ceiling results in lowest heat flux through wafer
    • Smallest wafer bow by vertical temperature gradient
    • Enabling standard Si wafer thickness
  • Customized temperature optimization by recess shaping