K850 Critical Point Dryer
The K850 combines versatility and ease of operation. Built-in thermo-electric heating and adiabatic cooling allow precise temperature control. The vertical pressure chamber (32 mm diameter x 47 mm) has a side viewing port which allows a clear view of the liquid meniscus during filling. A magnetic stirrer ensures optimal mixing and exchange of process fluids.
K850WM Large Chamber Critical Point Dryer
The K850WM is a compact, bench-top instrument designed to critical point dry a complete 6"/150 mm wafer. A convenient wafer holder allows rapid transfer and ensures that pre-drying does not occur
K1050X RF Plasma Etcher/Asher/Cleaner
The K1050X is a modern, solid-state RF plasma barrel reactor designed to meet the requirements of research and development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications
Solarus Advanced Plasma Cleaning System
Advanced plasma cleaning system for removal of hydrocarbon contamination on TEM and SEM samples
Disc Grinder System
Pre-thin and polish your samples to reduce ion milling times and improve quality.
Dimple Grinder
Fast and reliable mechanical method of pre-thinning to near electron transparency to greatly reduce your ion milling times and uneven thinning
ION POLISHING SYSTEM
Precision ion polishing system for precise centering, control, and reproducibility of your milling process
Ultrasonic Cutter
Cut your brittle materials beyond the 3 mm transmission electron microscope (TEM) disc to accurately cut holes or unique shapes
Cross Section Kit
Ideal for preparing cross sectional transmission electron microscopy (XTEM) samples of semiconductor devices, thin films of various substrates, and composites
Cryoplunge 3 System
Semi-automated plunge freezing instrument
nanoCVD
nanoCVD systems use cold-walled technology to provide rapid production of high-quality CVD carbon nanomaterials. All systems are designed for benchtop positioning with minimal installation requirements
ICP plasma deposition system SI 500 D
The high end ICPECVD system SI 500 D provides exceptional performance for plasma based deposition processes. High quality dielectric and Si films are deposited using high density PECVD generated with the PTSA ICP plasma source