Scanning XPS Microprobe

VersaProbe II

The core technology of the VersaProbe II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling, and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 10 µm. Multi-technique options include a scanning electron gun for submicron surface analysis by Auger Electron Spectroscopy, a UV lamp for Ultra-violet Photoelectron Spectroscopy measurements, a hot/cold sample stage, and sample treatment chambers.

New features available with VersaProbe II include a 128 channel mode detector, the intuitive SmartSoft-XPS user interface, and optional 20 kV C60 +, and 20 kV Ar2500+ cluster source ion guns for polymer and organic thin film analysis.

Micro-Focused Scanning X-ray Source

Unique Technology

  • Micro-focused, raster scanned x-ray beam
  • X-ray beam induced secondary electron imaging
  • XPS images with spectra at each pixel for retrospective chemical analysis
  • Point or multi-point spectroscopy
  • Point or multi-point thin film analysis

Large Area Spectroscopy

Turnkey Auto Analysis

  • Point and click analysis area definition
  • Robust Auto-Z sample alignment at all spot sizes
  • No-tune dual beam charge neutralization
  • Move without concern from insulator to conductor in auto analysis sequences

Fully Automated Unattended Analysis

Micro Area Spectroscopy

Superior Micro Area Performance

  • Point and click analysis area definition
  • Robust Auto-Z sample alignment
  • No-tune dual beam charge neutralization
  • Move without concern from insulator to conductor in auto analysis sequences

Thin Film Analysis

Optimized Configuration

  • Micro-focused x-ray beam
  • High sensitivity spectrometer
  • High performance floating column argon ion gun
  • Turnkey dual beam charge neutralization
  • Compucentric Zalar Rotation™

Inorganic Thin Film Analysis

  • High performance 0-5 keV Ar+ ion gun
    • Low voltage floating column for ultra thin film analysis
    • Bend in ion column to stop neutrals
  • Compucentric Zalar Rotation
  • Robust dual beam charge neutralization
  • Micro-area depth profiling
  • Multi-point depth profiling

Organic Thin Film Analysis

  • Optional 10 and 20 kV C60 ion guns
  • Optional 20 kV Ar2500+ gas cluster ion gun
    • Mass filtered cluster ion sources
    • Bend in ion column to stop neutrals
  • Compucentric Zalar rotation
  • Robust dual beam charge neutralization
  • Micro-area depth profiling
  • Multi-point depth profiling