Scanning XPS Microprobe
VersaProbe II
The core technology of the VersaProbe II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling, and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 10 µm. Multi-technique options include a scanning electron gun for submicron surface analysis by Auger Electron Spectroscopy, a UV lamp for Ultra-violet Photoelectron Spectroscopy measurements, a hot/cold sample stage, and sample treatment chambers.
New features available with VersaProbe II include a 128 channel mode detector, the intuitive SmartSoft-XPS user interface, and optional 20 kV C60 +, and 20 kV Ar2500+ cluster source ion guns for polymer and organic thin film analysis.
Micro-Focused Scanning X-ray Source
Unique Technology
- Micro-focused, raster scanned x-ray beam
- X-ray beam induced secondary electron imaging
- XPS images with spectra at each pixel for retrospective chemical analysis
- Point or multi-point spectroscopy
- Point or multi-point thin film analysis
Large Area Spectroscopy
Turnkey Auto Analysis
- Point and click analysis area definition
- Robust Auto-Z sample alignment at all spot sizes
- No-tune dual beam charge neutralization
- Move without concern from insulator to conductor in auto analysis sequences
Fully Automated Unattended Analysis
Micro Area Spectroscopy
Superior Micro Area Performance
- Point and click analysis area definition
- Robust Auto-Z sample alignment
- No-tune dual beam charge neutralization
- Move without concern from insulator to conductor in auto analysis sequences
Thin Film Analysis
Optimized Configuration
- Micro-focused x-ray beam
- High sensitivity spectrometer
- High performance floating column argon ion gun
- Turnkey dual beam charge neutralization
- Compucentric Zalar Rotation™
Inorganic Thin Film Analysis
- High performance 0-5 keV Ar+ ion gun
- Low voltage floating column for ultra thin film analysis
- Bend in ion column to stop neutrals
- Compucentric Zalar Rotation
- Robust dual beam charge neutralization
- Micro-area depth profiling
- Multi-point depth profiling
Organic Thin Film Analysis
- Optional 10 and 20 kV C60 ion guns
- Optional 20 kV Ar2500+ gas cluster ion gun
- Mass filtered cluster ion sources
- Bend in ion column to stop neutrals
- Compucentric Zalar rotation
- Robust dual beam charge neutralization
- Micro-area depth profiling
- Multi-point depth profiling