MiniLab systems provide superior coating performance, with the flexibility and modularity of design to address a huge range of customer requirements.

The MiniLab range consists of several platforms. Each platform is generally associated with a specific vacuum chamber size. While all chambers are built to the same standards, and allow for high-vacuum operation, larger chambers allow for more techniques and flexibility than their smaller counterparts.

In addition to thin-film deposition, MiniLab systems can also be fitted with complementary techniques such as ion beam sources, etching components, and annealing stages.


  • Electron-beam (‘e-beam’) evaporation: Ultra-high temperature evaporation of metals and non-metals such as dielectrics
  • Low-temperature thermal evaporation (LTE): Controlled low temperatures for evaporation of volatile materials, typically organic compounds
  • Standard thermal evaporation: Evaporation of metals from resistively heated filaments and boats
  • High-temperature thermal evaporation: High-current resistive evaporation of metals and non-metals
  • Magnetron sputtering: Plasma sputtering of metal and non-metal targets

It is possible to fit multiple techniques on-board a single MiniLab system.

We also offer a variety of substrate stage options (heating; cooling; bias; etching; rotation; etc.), and can incorporate most third-party vacuum components.

Please contact us using the form below to discuss your specific requirements

026system128x128-w128h128MiniLab 026 systems are ultra-compact floor standing vacuum evaporators for metal, dielectric and/or organic (OLED/PLED) thin-film deposition. The MiniLab 026 is also glovebox compatible and is the only system in the MiniLab range that can be easily retrofitted to an existing glovebox.

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