Location: Gatan R&D Headquarters, Pleasanton, CA
Date: October 17 – 20, 2017
School fee: $1,750
Electron energy loss spectroscopy (EELS) is a powerful technique that provides both compositional and chemical information from sub-nanometer areas in the sample.
MMR Technologies Software Suite Version 13.5 is now available for download
“HEA2D” consortium aims to create basis for end-to-end processing chain for two-dimensional nanomaterials
AIXTRON SE (FSE: AIXA; NASDAQ: AIXG) (“AIXTRON”) and Grand Chip Investment GmbH (“Grand Chip Investment”), a 100% indirect subsidiary of Fujian Grand Chip Investment Fund LP (“FGC”), have today entered into an agreement to take over AIXTRON. Fujian Grand Chip Investment Fund LP is a Chinese investment fund; 51% of which is held by the Chinese business man Zhendong Liu and 49% by Xiamen Bohao Investment Ltd.
AIXTRON’s graphene production technology impresses with scalability, maximum throughput and excellent uniformity
AIXTRON SE (FSE: AIXA; NASDAQ: AIXG), a worldwide leading provider of deposition equipment to the semiconductor industry, today announced a new order for a BM Pro system from Spanish company Graphenea, one of the world’s leading suppliers of graphene and related materials. Graphenea’s focus is in developing graphene-based films for use in the semiconductor industry.
AIXTRON’s production technology integrates imec’s proprietary materials technology to increase performance of GaN-on-Si-based power devices
The SENresearch 4.0 is an innovative ellipsometry solution which features widest spectral ranges and highest spectral resolution. The Step Scan Analyser (SSA) principle is applied for ellipsometric measurement. The extension of the SSA principle by the innovative 2C design allows measuring the full Mueller matrix. SENresearch 4.0 comes withSpectraRay/4, the new comprehensive ellipsometry software for advanced material analysis
SENTECH offers leading edge plasma process technology equipment for etching and deposition and thin film measurement instrumentation based on ellipsometry. The advanced SENTECH plasma equipment is based on the inductively coupled plasma source PTSA (planar triple spiral antenna) which was developed by SENTECH for low damage and high rate etching and deposition. The latest product development at SENTECH expands the ICPECVD product line by ALD and plasma enhanced ALD systems.
Non ci sono eventi in arrivo al momento.