PECVD – ICPECVD
PECVD loadlock system SI 500 PPD
The flexible PECVD system SI 500 PPD features a variety of standard plasma deposition processes. SiO2, SiNx, SiOxNy, and a-Si are deposited with capacitively coupled plasma.
PECVD direct loading system Depolab 200
The PECVD system Depolab 200 combines cost effective direct loading and parallel plate plasma source in a basic, compact design. The easy to use direct loading system enables user-friendly batch processing (with carrier or direct loading onto the substrate electrode). The clever PECVD system can be upgraded for enhanced performance on demand
ALD
MOCVD
MOCVD – Planetary Reactor
The Planetary Reactor is based on the principle of a horizontal laminar flow reactor. The laminar flow principle ensures extremely precise transitions between different materials, and an unparalleled control over the deposition rates for films that are only a few atoms thick
MOCVD – Close Coupled Showerhead
BLACK MAGIC PER DEPOSIZIONE DI GRAFENE E CNT
Black Magic 2″ – R&D
Applying this methodology, the deposition of thin films takes place by means of chemical reactions, in which the wafers are exposed to a gas mixture that reacts on the wafer surface. The process can also be plasma-enhanced
BLACK MAGIC PRO
Wafer-scale Deposition of Carbon Nanotubes and Graphene
BM Pro…
BM Pro…
