300 mm Wafer-scale Production of Carbon Nanotubes and Graphene
BLACK MAGIC 300
Features
- 1050° C substrate heater
- Uniform gas delivery through showerhead
- Precise precursor concentration control
- Heater to showerhead gap adjust
- Wafer rotation during process
- ARGUS real-time wafer temperature mapping
- Optical ports at normal incidence to wafer
Advanced Heater Design for Outstanding Uniformity
