Wafer-scale Deposition of Carbon Nanotubes and Graphene
Features
- Fast response heater, up to 300 °C/minute ramp rates
- Thermal CVD
- Plasma enhanced CVD
- Excellent reproducibility
- Closed loop infrared wafer temperature control
Advanced Design
- Plasma with frequency and duty cycle control
- Optimized geometry for uniformity
Control
- Automatic process control
- Easy recipe editing
- Integrated process camera
- Remote operation via TCP/IP
Benefits
- Fast growth and processing
- Low cost of ownership and maintenance
- Easy cleaning
- User accounts and access control
- Real-time data logging
- Consumables tracking Additional
Features
- Extra mass flow controllers
- Electrical feedthroughs for in-situ biasing
- Customized gas/liquid inputs
- Low temperature deposition
- Mass spectroscopy
Black Magic 2″ – R&D BLACK MAGIC 300
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