Wafer-scale Deposition of Carbon Nanotubes and Graphene

BM Pro · 4/6/12 inch


  • Fast response heater, up to 300 °C/minute ramp rates
  • Thermal CVD
  • Plasma enhanced CVD
  • Excellent reproducibility
  • Closed loop infrared wafer temperature control

Advanced Design

  • Plasma with frequency and duty cycle control
  • Optimized geometry for uniformity


  • Automatic process control
  • Easy recipe editing
  • Integrated process camera
  • Remote operation via TCP/IP


  • Fast growth and processing
  • Low cost of ownership and maintenance
  • Easy cleaning
  • User accounts and access control
  • Real-time data logging
  • Consumables tracking Additional


  • Extra mass flow controllers
  • Electrical feedthroughs for in-situ biasing
  • Customized gas/liquid inputs
  • Low temperature deposition
  • Mass spectroscopy

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