SC7620 Mini Sputter Coater/Glow Discharge System
The SC7620 is a compact entry-level SEM sputter coater
Q150R Rotary-Pumped Sputter Coater/Carbon Coater
The Q150R is a compact rotary-pumped coating system suitable for SEM sputtering with non-oxidising (noble) metals
Q300R T Triple Target, Large Chamber, Rotary-Pumped Sputter Coater
The Q300R T is a large chamber, rotary-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8"/200 mm (e.g. a wafer), or multiple smaller specimens over a similar diameter
Q300T T Triple Target, Large Chamber, Turbo-Pumped Sputter Coater
The Q300T T is a large chamber, turbo-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8"/200mm (eg a wafer), or multiple smaller specimens over a similar diameter. The Q300T T is suitable for sputtering both noble and oxidising metals for SEM specimen preparation and for thin film applications
E3100 Critical Point Dryer
The E3100 large chamber critical point dryer has been anindustry standard for over 35 years and is used in numerous scanning electron microscopy (SEM) laboratories around the world. Primarily used for the processing of lifesciences and geological specimens, the E3100 can also used for the controlled drying MEMs and aerogels. The E3100 is supplied with the E3100-01 tissue boat and has three slots each with three tissue baskets, giving a total of nine.
K850 Critical Point Dryer
The K850 combines versatility and ease of operation. Built-in thermo-electric heating and adiabatic cooling allow precise temperature control. The vertical pressure chamber (32 mm diameter x 47 mm) has a side viewing port which allows a clear view of the liquid meniscus during filling. A magnetic stirrer ensures optimal mixing and exchange of process fluids.
K850WM Large Chamber Critical Point Dryer
The K850WM is a compact, bench-top instrument designed to critical point dry a complete 6"/150 mm wafer. A convenient wafer holder allows rapid transfer and ensures that pre-drying does not occur
K1050X RF Plasma Etcher/Asher/Cleaner
The K1050X is a modern, solid-state RF plasma barrel reactor designed to meet the requirements of research and development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications
Solarus Advanced Plasma Cleaning System
Advanced plasma cleaning system for removal of hydrocarbon contamination on TEM and SEM samples
PECS II System
Broad argon ion beam system designed to polish and coat samples for SEM imaging and analytical techniques
Ilion II System
Ideal for low energy surface preparation for your SEM cross section viewing