RF Plasma Etcher/Asher/Cleaner


The K1050X is a modern, solid-state RF plasma barrel reactor designed to meet the requirements of research and development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications.

Key features

  • Drawer type specimen stage – gives easy convenient specimen access
  • Micro-controller: fully programmable by the operator – easy, flexible operation
  • Fully-automatic operation
  • Modern solid state 100 RF 13.56 MHz power supply – rugged and reliable
  • Two gas flow meters – allows precise control and mixing of process gases, especially useful for plasma etching processes
  • Vent control – minimal specimen disturbance – especially useful for fine plasma-ashed specimens
  • Turbomolecular pumped version available (K1050XT)