ION POLISHING SYSTEM

PIPS II SYSTEM

Key features:

  • X,Y stage permits alignment of argon beams to region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10″ color touch screen for display and control of all PIPS™ II parameters