RIE plasma etcher SI 591 compact
/0 Commenti/in Nanotech, Sistemi per etching reattivo /da DemoWith the SI 591 compact, a variety of chlorine and fluorine based plasma etching processes can be performed reproducibly with a vacuum load lock and fully computer controlled processing. The SI 591 compact is characterized by a small footprint and flexible design for RIE plasma etching, e.g. the SI 591 compact can be integrated into a cluster system.
Ilion II System
/0 Commenti/in Etching e Coating Systems /da DemoIdeal for low energy surface preparation for your SEM cross section viewing
PECS II System
/0 Commenti/in Etching e Coating Systems /da DemoBroad argon ion beam system designed to polish and coat samples for SEM imaging and analytical techniques
GP [CONCEPT]
/0 Commenti/in Glove box, Isolatori e Flow Box /da DemoTAILOR-MADE GLOVE BOX GP CONCEPT High performance purification glove box, modular and versatile for products and/oroperator protection. <1ppm O2/H2O Tailor-made drawings made according to your requirements. BENEFIT Atmosphere <1pmm O2/H2O, with low gas consumption. Work in underpressure or overpressure. Automatically assisted management and parameters recording. Integration of any type of material. Tailor-made drawings according to […]
GP [CAMPUS]
/0 Commenti/in Glove box, Isolatori e Flow Box /da DemoCompact glove box with purification system
2m Strumenti S.R.L.
Piazza Leonardo Sciascia, 5
00137 Roma Italy
Tel: +39 06 868 74 357
Fax: +39 06 868 95 241
Email: info@2mstrumenti.com
Pec : 2mstrumenti@2mstrumenti.legalmail.it
00137 Roma Italy
Tel: +39 06 868 74 357
Fax: +39 06 868 95 241
Email: info@2mstrumenti.com
Pec : 2mstrumenti@2mstrumenti.legalmail.it
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